An experimental study of solid source diffusion by spin on dopants and its application for minimal silicon-on-insulator CMOS fabrication
Liu, Yongxun, Koga, Kazuhiro, Khumpuang, Sommawan, Nagao, Masayoshi, Matsukawa, Takashi, Hara, ShiroVolume:
56
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.56.06GG01
Date:
June, 2017
File:
PDF, 1.74 MB
english, 2017