Highly-impermeable Al 2 O 3 /HfO 2 moisture barrier films...

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Organic Electronics 2017 / 8

Highly-impermeable Al 2 O 3 /HfO 2 moisture barrier films grown by low-temperature plasma-enhanced atomic layer deposition

Kim, Lae Ho, Jang, Jin Hyuk, Jeong, Yong Jin, Kim, Kyunghun, Baek, Yonghwa, Kwon, Hyeok-jin, An, Tae Kyu, Nam, Sooji, Kim, Se Hyun, Jang, Jaeyoung, Park, Chan Eon
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Language:
english
Journal:
Organic Electronics
DOI:
10.1016/j.orgel.2017.07.051
Date:
August, 2017
File:
PDF, 2.59 MB
english, 2017
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