Surface Phenomena During Plasma-Assisted Atomic Layer...

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ACS Applied Materials & Interfaces 2017 / 08

Surface Phenomena During Plasma-Assisted Atomic Layer Etching of SiO 2

Gasvoda, Ryan James, van de Steeg, Alex W., Bhowmick, Ranadeep, Hudson, Eric A, Agarwal, Sumit
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Language:
english
Journal:
ACS Applied Materials & Interfaces
DOI:
10.1021/acsami.7b08234
Date:
August, 2017
File:
PDF, 2.68 MB
english, 2017
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