Study of the interface stability of the metal (Mo, Ni,...

AIP Advances 2017 / 08 Vol. 7; Iss. 8

Study of the interface stability of the metal (Mo, Ni, Pd)/HfO 2 /AlN/InGaAs MOS devices

Do, Huy Binh, Luc, Quang Ho, Ha, Minh Thien Huu, Huynh, Sa Hoang, Nguyen, Tuan Anh, Lin, Yueh Chin, Chang, Edward Yi
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Volume:
7
Language:
english
Journal:
AIP Advances
DOI:
10.1063/1.4986147
Date:
August, 2017
File:
PDF, 3.78 MB
english, 2017
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