[AIP ION IMPLANTATION TECHNOLOGY: 17th International Conference on Ion Implantation Technology - Monterey (California) (8–13 June 2008)] AIP Conference Proceedings - Increase of Boron Ion Beam Current Extracted from a Multi-Cusp Ion Source in an Ion Doping System with Mass Separation
Inouchi, Yutaka, Dohi, Shojiro, Tanii, Masahiro, Tatemichi, Junichi, Konishi, Masashi, Nukayama, Masaaki, Nakao, Kazuhiro, Orihira, Koichi, Naito, Masao, Seebauer, Edmund G., Felch, Susan B., Jain, AmYear:
2008
Language:
english
DOI:
10.1063/1.3033623
File:
PDF, 1.05 MB
english, 2008