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New non-chemically amplified molecular resist design with switchable sensitivity for multi-lithography applications and nanopatterning
Thakur, Neha, Reddy, Pulikanti Guruprasad, NANDI, SANTU, Yogesh, Midathala, Sharma, Satinder Kumar, Pradeep, Chullikkattil P, Ghosh, Subrata, Gonsalves, Kenneth ELanguage:
english
Journal:
Journal of Micromechanics and Microengineering
DOI:
10.1088/1361-6439/aa8751
Date:
August, 2017
File:
PDF, 798 KB
english, 2017