Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
2014 / 11 Vol. 32; Iss. 6
Ultrahigh NA, high aspect ratio interference lithography with resonant dielectric underlayers
Lowrey, Sam, Bourke, Levi, Ding, Boyang, Blaikie, RichardVolume:
32
Language:
english
Journal:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
DOI:
10.1116/1.4894168
Date:
November, 2014
File:
PDF, 3.36 MB
english, 2014