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A Kriging framework for the efficient exploitation of the nanoscale junctioless DG MOSFETs including source/drain extensions and hot carrier effect
Bentrcia, Toufik, Djeffal, Fayçal, Chebaki, Elasaad, Arar, DjemaiVolume:
4
Year:
2017
Language:
english
Journal:
Materials Today: Proceedings
DOI:
10.1016/j.matpr.2017.07.007
File:
PDF, 466 KB
english, 2017