Dose Loss of Ultralow-energy Implanted Boron into Silicon...

Dose Loss of Ultralow-energy Implanted Boron into Silicon during Annealing

Tsuji, Hiroshi, Furuhashi, Masayuki, Tachi, Masayuki, Taniguchi, Kenji
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Volume:
124
Year:
2004
Journal:
IEEJ Transactions on Electronics, Information and Systems
DOI:
10.1541/ieejeiss.124.1044
File:
PDF, 176 KB
2004
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