Dose Loss of Ultralow-energy Implanted Boron into Silicon during Annealing
Tsuji, Hiroshi, Furuhashi, Masayuki, Tachi, Masayuki, Taniguchi, KenjiVolume:
124
Year:
2004
Journal:
IEEJ Transactions on Electronics, Information and Systems
DOI:
10.1541/ieejeiss.124.1044
File:
PDF, 176 KB
2004