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As doping of Si–Ge–Sn epitaxial semiconductor materials on a commercial CVD reactor
Bhargava, Nupur, Margetis, Joe, Tolle, JohnVolume:
32
Language:
english
Journal:
Semiconductor Science and Technology
DOI:
10.1088/1361-6641/aa7e19
Date:
September, 2017
File:
PDF, 2.47 MB
english, 2017