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Improved PECVD Si x N y film as a mask layer for deep wet etching of the silicon
Han, Jianqiang, Yin, Yi Jun, Han, Dong, Dong, LiZhenVolume:
4
Language:
english
Journal:
Materials Research Express
DOI:
10.1088/2053-1591/aa8782
Date:
September, 2017
File:
PDF, 741 KB
english, 2017