Thermal rectification in silicon by a graded distribution of defects
Dettori, Riccardo, Melis, Claudio, Rurali, Riccardo, Colombo, LucianoVolume:
119
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.4953142
Date:
June, 2016
File:
PDF, 3.81 MB
english, 2016