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Microhardness and internal stress of Si3N4-SiC films prepared by plasma CVD
Kiichiro Kamata, Naoyoshi Aizawa, Minoru MoriyamaVolume:
5
Language:
english
Pages:
3
DOI:
10.1007/bf01730281
Date:
October, 1986
File:
PDF, 215 KB
english, 1986