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Investigation of optical properties of silicon oxynitride films deposited by RF PECVD method
Kijaszek, Wojciech, Oleszkiewicz, Waldemar, Zakrzewski, Adrian, Patela, Sergiusz, Tłaczała, MarekVolume:
34
Language:
english
Journal:
Materials Science-Poland
DOI:
10.1515/msp-2016-0111
Date:
January, 2016
File:
PDF, 573 KB
english, 2016