Adhesion of NCF to oxidized Si wafers after oxygen plasma...

Adhesion of NCF to oxidized Si wafers after oxygen plasma treatment

Jang, Min-Seok, Ma, Sung Woo, Song, Jongsoo, Sung, Myungmo, Kim, Young-Ho
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Volume:
78
Language:
english
Journal:
Microelectronics Reliability
DOI:
10.1016/j.microrel.2017.09.001
Date:
November, 2017
File:
PDF, 1.50 MB
english, 2017
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