Plasma-enhanced chemical-vapor deposition of silicon...

Japanese Journal of Applied Physics 2015 / 08 Vol. 54; Iss. 8S1

Plasma-enhanced chemical-vapor deposition of silicon nitride film for high resistance to potential-induced degradation

Mishina, Ken, Ogishi, Atsufumi, Ueno, Kiyoshi, Jonai, Sachiko, Ikeno, Norihiro, Saruwatari, Tetsuya, Hara, Kohjiro, Ogura, Atsushi, Yamazaki, Toshiharu, Doi, Takuya, Shinohara, Makoto, Masuda, Atsushi
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Volume:
54
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.54.08KD12
Date:
August, 2015
File:
PDF, 1.79 MB
english, 2015
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