Calibration of exposure dose for nanoscale plasmonic lithography with microsized far-field spot patterns
Han, Dandan, Park, Changhoon, Jung, Howon, Hahn, Jae WVolume:
26
Language:
english
Journal:
Journal of Micromechanics and Microengineering
DOI:
10.1088/0960-1317/26/9/095001
Date:
September, 2016
File:
PDF, 784 KB
english, 2016