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RF-magnetron sputtering deposition of ultra-thin Hf 0.5 Zr 0.5 O 2 films for non-volatile memory applications
Ambriz-Vargas, F., Nouar, R., Kolhatkar, G., Sarkissian, A., Thomas, R., Gomez-Yáñez, C., Gauthier, M.A., Ruediger, A.Volume:
4
Year:
2017
Language:
english
Journal:
Materials Today: Proceedings
DOI:
10.1016/j.matpr.2017.07.030
File:
PDF, 2.28 MB
english, 2017