Observation of silicon self-diffusion enhanced by the...

Observation of silicon self-diffusion enhanced by the strain originated from end-of-range defects using isotope multilayers

Isoda, Taiga, Uematsu, Masashi, Itoh, Kohei M.
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Volume:
118
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.4931421
Date:
September, 2015
File:
PDF, 1.71 MB
english, 2015
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