Influences of elastic strain at oxide mask edges on the distribution of B ions implanted in silicon crystals
Nikulin, A. Yu., Sakata, O., Hashizume, H.Volume:
49
Journal:
Acta Crystallographica Section A Foundations of Crystallography
DOI:
10.1107/s0108767378089643
Date:
August, 1993
File:
PDF, 112 KB
1993