Improved thermoelectric properties of nanocrystalline...

Thin Solid Films 2017 / 11 Vol. 642

Improved thermoelectric properties of nanocrystalline hydrogenated silicon thin films by post-deposition thermal annealing

Loureiro, Joana, Mateus, Tiago, Filonovich, Sergej, Ferreira, Marisa, Figueira, Joana, Rodrigues, Alexandra, Donovan, Brian F., Hopkins, Patrick E., Ferreira, Isabel
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Volume:
642
Language:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2017.09.047
Date:
November, 2017
File:
PDF, 1.04 MB
english, 2017
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