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AIP Conference Proceedings [AIP ION IMPLANTATION TECHNOLOGY 2012: Proceedings of the 19th International Conference on Ion Implantation Technology - Valladolid, Spain (25–29 June 2012)] - Microwave ECR plasma electron flood for low pressure wafer charge neutralization
Vanderberg, Bo, Nakatsugawa, Tomoya, Divergilio, WilliamYear:
2012
Language:
english
DOI:
10.1063/1.4766562
File:
PDF, 765 KB
english, 2012