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Selective epitaxial growth of stepwise SiGe:B at the recessed sources and drains: A growth kinetics and strain distribution study
Koo, Sangmo, Jang, Hyunchul, Kim, Sun-Wook, Ko, Dae-HongVolume:
6
Language:
english
Journal:
AIP Advances
DOI:
10.1063/1.4963296
Date:
September, 2016
File:
PDF, 17.18 MB
english, 2016