Effect of Al Sputtering Current on Structure of CrAlN Thin...

Applied Mechanics and Materials 2017 / 6 Vol. 866

Effect of Al Sputtering Current on Structure of CrAlN Thin Films Prepared by Reactive DC Magnetron Co-Sputtering

Khambun, Amonrat, Buranawong, Adisorn, Witit-Anun, Nirun
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Volume:
866
Language:
english
Journal:
Applied Mechanics and Materials
DOI:
10.4028/www.scientific.net/AMM.866.322
Date:
June, 2017
File:
PDF, 1.22 MB
english, 2017
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