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Progress in Polymer Science 2017 / 10

Silicon-Containing Block Copolymers for Lithographic Applications

Lo, Ting-Ya, Krishnan, Mohan Raj, Lu, Kai-Yuan, Ho, Rong-Ming
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Language:
english
Journal:
Progress in Polymer Science
DOI:
10.1016/j.progpolymsci.2017.10.002
Date:
October, 2017
File:
PDF, 6.05 MB
english, 2017
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