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RF bias to suppress post-oxidation of μc-Si:H films deposited by inductively-coupled plasma using a planar RF resonant antenna
Demolon, P., Guittienne, Ph, Howling, A.A., Jost, S., Jacquier, R., Furno, I.Language:
english
Journal:
Vacuum
DOI:
10.1016/j.vacuum.2017.10.020
Date:
October, 2017
File:
PDF, 1.82 MB
english, 2017