![](/img/cover-not-exists.png)
Low temperature one-step growth of AlON thin films with homogenous nitrogen doping profile by plasma enhanced atomic layer deposition
Chen, Hong-Yan, Lu, Hong-Liang, Chen, Jin-Xin, Zhang, Feng, Ji, Xin-Ming, Liu, Wen-Jun, Yang, Xiao-Feng, Zhang, David WeiLanguage:
english
Journal:
ACS Applied Materials & Interfaces
DOI:
10.1021/acsami.7b12262
Date:
October, 2017
File:
PDF, 1.81 MB
english, 2017