Memcapacitive characteristics in reactive-metal (Mo, Al)/HfO X /n-Si structures through migration of oxygen by applied voltage
Yang, Paul, Noh, Young Jun, Baek, Yoon-Jae, Zheng, Hong, Kang, Chi Jung, Lee, Hyun Ho, Yoon, Tae-SikVolume:
108
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.4941548
Date:
February, 2016
File:
PDF, 2.01 MB
english, 2016