Improving interfacial and electrical properties of HfO2/SiO2/p-Si stacks with N2-plasma-treated SiO2 interfacial layer
Chen, Xiao-Qiang, Xiong, Yu-Hua, Du, Jun, Wei, Feng, Zhao, Hong-Bin, Zhang, Qing-Zhu, Zhang, Wen-Qiang, Liang, Xiao-PingLanguage:
english
Journal:
Rare Metals
DOI:
10.1007/s12598-017-0958-x
Date:
October, 2017
File:
PDF, 1.29 MB
english, 2017