Improving interfacial and electrical properties of...

Improving interfacial and electrical properties of HfO2/SiO2/p-Si stacks with N2-plasma-treated SiO2 interfacial layer

Chen, Xiao-Qiang, Xiong, Yu-Hua, Du, Jun, Wei, Feng, Zhao, Hong-Bin, Zhang, Qing-Zhu, Zhang, Wen-Qiang, Liang, Xiao-Ping
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Language:
english
Journal:
Rare Metals
DOI:
10.1007/s12598-017-0958-x
Date:
October, 2017
File:
PDF, 1.29 MB
english, 2017
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