Annealing study of H 2 O and O...

Physica Scripta 2006 / 09 Vol. T126

Annealing study of H 2 O and O 3 grown Al 2 O 3 deposited by atomic layer chemical vapour deposition on n-type 4H-SiC

Avice, Marc, Grossner, Ulrike, Nilsen, Ola, Christensen, Jens S, Fjellvåg, Helmer, Svensson, Bengt G
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Volume:
T126
Language:
english
Journal:
Physica Scripta
DOI:
10.1088/0031-8949/2006/T126/002
Date:
September, 2006
File:
PDF, 359 KB
english, 2006
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