Difference in Reaction Schemes in Photolysis of...

Applied Physics Express 2008 / 3 Vol. 1

Difference in Reaction Schemes in Photolysis of Triphenylsulfonium Salts between 248 nm and Dry/Wet 193 nm Resists

Matsui, Yoshinori, Sugawara, Hidekazu, Seki, Shu, Kozawa, Takahiro, Tagawa, Seiichi, Itani, Toshiro
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Volume:
1
Language:
english
Journal:
Applied Physics Express
DOI:
10.1143/APEX.1.036001
Date:
March, 2008
File:
PDF, 373 KB
english, 2008
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