Conduction Mechanism and Improved Endurance in HfO2-Based...

Nanoscale Research Letters 2017 / 12 Vol. 12; Iss. 1

Conduction Mechanism and Improved Endurance in HfO2-Based RRAM with Nitridation Treatment

Yuan, Fang-Yuan, Deng, Ning, Shih, Chih-Cheng, Tseng, Yi-Ting, Chang, Ting-Chang, Chang, Kuan-Chang, Wang, Ming-Hui, Chen, Wen-Chung, Zheng, Hao-Xuan, Wu, Huaqiang, Qian, He, Sze, Simon M.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
12
Language:
english
Journal:
Nanoscale Research Letters
DOI:
10.1186/s11671-017-2330-3
Date:
December, 2017
File:
PDF, 3.33 MB
english, 2017
Conversion to is in progress
Conversion to is failed