Deposition of micro crystalline silicon films using microwave plasma enhanced chemical vapor deposition
Altmannshofer, Stephan, Miller, Bastian, Holleitner, Alexander W., Boudaden, Jamila, Eisele, Ignaz, Kutter, ChristophLanguage:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2017.10.031
Date:
October, 2017
File:
PDF, 1.59 MB
english, 2017