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Investigation of hydrogen inductively coupled plasma treatment effect for Ge 0.938 Sn 0.062 /Ge/Si film using photoreflectance spectroscopy
Jo, Hyun-Jun, Kim, Jong Su, Ryu, Mee-Yi, Yeo, Yung Kee, Kouvetakis, JohnLanguage:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2017.10.059
Date:
October, 2017
File:
PDF, 819 KB
english, 2017