Scanning tunneling microscopy study on the oxidation and annealing of Ga/Si(111)
Okada, Arifumi, Naeshirozako, Takuya, Nishimura, Keiya, Yoshimura, Masamichi, Kadono, KoheiVolume:
56
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.56.045202
Date:
April, 2017
File:
PDF, 1.19 MB
english, 2017