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Effect of carbon situating at end-of-range defects on silicon self-diffusion investigated using pre-amorphized isotope multilayers
Isoda, Taiga, Uematsu, Masashi, Itoh, Kohei M.Volume:
55
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.55.036504
Date:
March, 2016
File:
PDF, 948 KB
english, 2016