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Effects of Si/SiO2 interface stress on the performance of ultra-thin-body field effect transistors: A first-principles study
Jung, Hyo-Eun, Shin, MincheolLanguage:
english
Journal:
Nanotechnology
DOI:
10.1088/1361-6528/aa9a69
Date:
November, 2017
File:
PDF, 10.56 MB
english, 2017