Formation of high aspect ratio fused silica nanowalls by...

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Nano-Structures & Nano-Objects 2017 / 10

Formation of high aspect ratio fused silica nanowalls by fluorine-based deep reactive ion etching

Park, Jung-Rae, Berndt, Aaron, Kim, Young Keun, Lee, Ji Sung, Ryu, Jong Eun, Choi, Daniel Sunghoi
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Language:
english
Journal:
Nano-Structures & Nano-Objects
DOI:
10.1016/j.nanoso.2017.10.004
Date:
October, 2017
File:
PDF, 1.24 MB
english, 2017
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