![](/img/cover-not-exists.png)
Cleaning level of the target before deposition by reactive direct current magnetron sputtering
Hernandez Utrera, O., Abundiz-Cisneros, N., Sanginés, R., Diliegros-Godines, C.J., Machorro, R.Language:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2017.11.035
Date:
November, 2017
File:
PDF, 1.20 MB
english, 2017