Passivation of Ge/high- κ...

Semiconductor Science and Technology 2018 / 01 Vol. 33; Iss. 1

Passivation of Ge/high- κ interface using RF Plasma nitridation

Dushaq, Ghada, Nayfeh, Ammar, Rasras, Mahmoud
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Volume:
33
Language:
english
Journal:
Semiconductor Science and Technology
DOI:
10.1088/1361-6641/aa98cd
Date:
January, 2018
File:
PDF, 2.76 MB
english, 2018
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