Generation and elimination of silicon pitting for 300 mm...

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 2017 / 11 Vol. 35; Iss. 6

Generation and elimination of silicon pitting for 300 mm CMOS process technologies

Pani, Santosh Kumar, Hogan, Royston Hugh, Pandurangan, Madhavan, Zhang, Jian, Koesun, Pak
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Volume:
35
Language:
english
Journal:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
DOI:
10.1116/1.4995023
Date:
November, 2017
File:
PDF, 1.29 MB
english, 2017
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