Effect of Fluoride-based Plasma Treatment on the...

ETRI Journal 2016 / 04

Effect of Fluoride-based Plasma Treatment on the Performance of AlGaN/GaN MISFET

Ahn, Ho-Kyun, Kim, Hae-Cheon, Kang, Dong-MIn, Kim, Sung-Il, Lee, Jong-Min, Lee, Sang-Heung, Min, Byoung-Gue, Yoon, Hyoung-Sup, Kim, Daong-Young, Lim, Jong-Won, Kwon, Yong-Hwan, Nam, Eun-Soo, Lee, Jung
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Language:
english
Journal:
ETRI Journal
DOI:
10.4218/etrij.16.0015.0040
Date:
April, 2016
File:
PDF, 5.03 MB
english, 2016
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