Structural analysis of polycrystalline silicon thin films...

Materials Science in Semiconductor Processing 2018 / 03 Vol. 75

Structural analysis of polycrystalline silicon thin films produced by two different ICPCVD approaches

Li, Zhongli, Letha, Ayra Jagadhamma, Wei, Jia-Fu, Lu, Man-Ling, Liu, Yijian, Hwang, Huey-Liang, Zhang, Yafei
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Volume:
75
Language:
english
Journal:
Materials Science in Semiconductor Processing
DOI:
10.1016/j.mssp.2017.08.016
Date:
March, 2018
File:
PDF, 1.72 MB
english, 2018
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