Low-temperature formation of crystalline Si:H/Ge:H...

Japanese Journal of Applied Physics 2017 / 06 Vol. 56; Iss. 6S1

Low-temperature formation of crystalline Si:H/Ge:H heterostructures by plasma-enhanced CVD in combination with Ni-nanodots seeding nucleation

Lu, Yimin, Makihara, Katsunori, Takeuchi, Daichi, Ikeda, Mitsuhisa, Ohta, Akio, Miyazaki, Seiichi
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Volume:
56
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.56.06GG07
Date:
June, 2017
File:
PDF, 1.64 MB
english, 2017
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