Sensitivity enhancement of chemically amplified EUV resists by adding acid-generating promoters
Fujii, Shinya, Okamoto, Kazumasa, Yamamoto, Hiroki, Kozawa, Takahiro, Itani, ToshiroVolume:
56
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.56.06GD01
Date:
June, 2017
File:
PDF, 849 KB
english, 2017