Time-dependent dielectric breakdown characterizations of interlayer dielectric damage induced during plasma processing
Shinohara, Kengo, Nishida, Kentaro, Ono, Kouichi, Eriguchi, KojiVolume:
56
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.56.06HD03
Date:
June, 2017
File:
PDF, 2.70 MB
english, 2017