Characteristics of low- κ SiOC films deposited via atomic...

Thin Solid Films 2018 / 01 Vol. 645

Characteristics of low- κ SiOC films deposited via atomic layer deposition

Lee, Jaemin, Jang, Woochool, Kim, Hyunjung, Shin, Seokyoon, Kweon, Youngkyun, Lee, Kunyoung, Jeon, Hyeongtag
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Volume:
645
Language:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2017.10.045
Date:
January, 2018
File:
PDF, 775 KB
english, 2018
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