A relation between the ion flux and plasma density in an RF...

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Plasma Sources Science and Technology 2017 / 12

A relation between the ion flux and plasma density in an RF CCP discharge.

Bogdanova, Maria, Lopaev, D, Zyryanov, S M, Voloshin, D, Rakhimova, T V
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Language:
english
Journal:
Plasma Sources Science and Technology
DOI:
10.1088/1361-6595/aaa237
Date:
December, 2017
File:
PDF, 771 KB
english, 2017
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