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Positive gate bias stress-induced hump-effect in elevated-metal metal–oxide thin film transistors
Qi, Dong-Yu, Zhang, Dong-Li, Wang, Ming-XiangVolume:
26
Language:
english
Journal:
Chinese Physics B
DOI:
10.1088/1674-1056/26/12/128101
Date:
December, 2017
File:
PDF, 505 KB
english, 2017