Evaluation of valence band top and electron affinity of SiO 2 and Si-based semiconductors using X-ray photoelectron spectroscopy
Fujimura, Nobuyuki, Ohta, Akio, Makihara, Katsunori, Miyazaki, SeiichiVolume:
55
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.55.08PC06
Date:
August, 2016
File:
PDF, 1.10 MB
english, 2016